Waferpedia

Comparison ledger

11600 SRDversusRC 8 MS 3 Spin

Semitool 11600 SRD, SUSS MicroTec RC 8 MS 3 Spin, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
11600 SRDSemitool
RC 8 MS 3 SpinSUSS MicroTec
OEMSemitoolSUSS MicroTec
CategoryWet Processing / CleanWet Processing / Clean
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilySemitool 11600 SRDSUSS MicroTec RC 8 MS 3 Spin
Specifications
ConfigurationCeramic[1]With controller[2]
ManufacturerSemitool[1]—
Model11600 SRD[1]—
Equipment typeSpin Rinse Dryer[1]—
Frequency—50 Hz[2]
Voltage—220 V[2]
Does not include add-ons (ex—edge bead removal / dispense and autoclean)[2]
Type—Spin coater[2]
Vintage—2001[3]
Controller—With controller[2]
High Gyrset—3, 5 and 8[3]
Air—4-9 bar[3]
Vacuum—-0.6 bar[3]

Plan your fab

Building a Wet Processing / Clean process? Get a complete equipment list.

Open the fab equipment planner →
Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]semistarcorp.comsemistarcorp.com