Comparison ledger
SUSS MicroTec 350W MJB3 Mask, SUSS MicroTec MJB 3 350 W Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 350W MJB3 MaskSUSS MicroTec | MJB 3 350 W MaskSUSS MicroTec |
|---|---|---|
| OEM | SUSS MicroTec | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | Wafer Equipment | Wafer Equipment |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | SUSS MicroTec 350W MJB3 Mask | SUSS MicroTec MJB3 350W Mask |
| Specifications | ||
| Wafer size | Wafer Equipment[1] | Wafer Equipment[2] |
| - Model | MJB3 Main System[1] | MJB3 Main System[2] |
| - Manufacturer | Suss MicroTec / Karl Suss[1] | Suss MicroTec / Karl Suss[2] |
| - Max Wafer Size | 3" Diameter[1] | 3" Diameter[2] |
| - Eyepieces | 10x[1] | 10x[2] |
| - Objectives | 3.5x and 10x[1] | 3.5x and 10x[2] |
| - Exposure Mode | Vacuum Contact, Hard & Soft[1] | Vacuum Contact, Hard & Soft[2] |
| - Exposure Resolution | 0.8 Microns (under optimum conditions)[1] | 0.8 Microns (under optimum conditions)[2] |
| - Alignment Resolution | 0.25um (operator dependant)[1] | 0.25um (operator dependant)[2] |
| Alignment mode | Top Side Alignment[1] | — |
| Power supply | CIC 500[1] | — |
| Lamphouse | 350 watt[1] | — |
| Exposure optics | UV400 exposure optics for 365nm and 405nm exposure[1] | — |
| Microscope | Suss M230 Splitfield Microscope[1] | — |
| Maskholder | 1 included for 4"x4" masks[1] | — |
| Wafer chuck | 1 included[1] | — |
| Bulb | Brand new 350W bulb, qty. 1 included[1] | — |
| Manual | Operations Manual for Suss MJB3 Mask Aligner[1] | — |
| Configured for | Top Side Alignment[1] | — |
| Wafer Sizes | — | 3 inch[3] |
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