Waferpedia

Comparison ledger

Alpha 801 D Verticalversus0332 F 9453 302 Diffusion

Tokyo Electron Alpha 801 D Vertical, Varian 0332 F 9453 302 Diffusion, side by side. Every value shown is drawn from the cited encyclopedia entries.

Email
Side-by-side comparison of selected equipment models
Attribute
Alpha 801 D VerticalTokyo Electron
OEMTokyo ElectronVarian
CategoryThermal / DiffusionThermal / Diffusion
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyTokyo Electron AlphaVarian 0332 F 9453 302 Diffusion
Specifications
ConfigurationATM Oxide[1]—
Power AC480 V[1]—
Phase3 Phase[1]—
TypeVertical Furnace[2]—
Wafer Size8 inch[1]—
Process TypeATM Oxide (atmospheric oxide deposition)[2]—
Power480 V AC, 3 Phase[2]—
Frequency50/60 Hz[1]—
ManufacturerTokyo Electron[2]—
ModelAlpha 801 D Vertical[1]0332 F 9453 302[3]
CategoryThermal / Diffusion[2]Thermal / Diffusion[5]
Asset Number—142841[3]
Last Confirm Date—October 14, 2025[4]
Make—Varian[3]
Tool type—diffusion pump[5]

Plan your fab

Building a Thermal / Diffusion process? Get a complete equipment list.

Open the fab equipment planner →
Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]Equipment inventory listing
  4. [4]fab-spares.comfab-spares.com
  5. [5]waferpedia.comwaferpedia.com