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Comparison ledger

160 XPversusE 1000 HP Ion

Varian 160 XP, Varian E 1000 HP Ion, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
160 XPVarian
OEMVarianVarian
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyVarian 160 XPVarian E 1000 HP Ion
Cited variants—
Specifications
Configuration (160 XP Ion variant)150mm High Current IMP[1]—
Phase—3 Phase[2]
Configuration—Leybold QDP-80, D8 Roughing Pumps[2]
OEM—Varian[3]
Model—E 1000 HP[3]
Asset #—126887[3]
Wafer sizes—6, 8 inch[2]
Power—3 Phase[2]
Roughing pumps—Leybold QDP-80, D8 Roughing Pumps[2]
Cryo compressor—CTI 8250 Cryo Compressor (x2)[2]
Manuals—Included[2]
Vintage—1995[2]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]inventory listing
  3. [3]Equipment inventory listing