Comparison ledger
Zeiss Leo 1530 FE-SEM and Zeiss Sigma HDVP, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | Leo 1530 FE-SEMZeiss | Sigma HDVPZeiss |
|---|---|---|
| OEM | Zeiss | Zeiss |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Zeiss LEO | Zeiss Sigma |
| Specifications | ||
| Configuration | Four-Quadrant Backscattered Electron Detector (4QBSD)[1] | Electron source[2] |
| OXFORD 6901 EDX Detector with resolution | 133 eV at 5.9 KeV[1] | — |
| Determination area | 10 mm²[1] | — |
| Acceleration voltage | — | 0.02 kV - 30 kV[2] |
| Magnification range | — | 10-1.000.000x[2] |
| Specimen chamber | — | 358 mm[2] |
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