Comparison ledger
ABM -407B-1-S-CES293 Robot, Hitachi U 3900 H Spectrophotometer, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | U 3900 H SpectrophotometerHitachi | |
|---|---|---|
| OEM | ABM | Hitachi |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ABM -407B-1-S-CES293 Robot | Hitachi U 3900 |
| Specifications | ||
| Model | ABM-407B-1-S-CES293[1] | U 3900 H[3] |
| Description | ROBOT[1] | — |
| Refurbished RTP RTA | AG Associates 4100, 4108, 8108, 8800, 8800i,210, 310, 410, 610, 610I, MPT RTP-600S, 800S, RTP-3000[1] | — |
| KLA-Tencor Spare Parts and Service | RS-35C,RS-55,RS-75,RS-100,UV-1050,UV-1080,UV-1250,UV-1280,ASET F5 / F5X,AIT Systems,HRP-220 Stylus Profiler[1] | — |
| Refurbished Isotropic Plasma Etcher | Matrix, Tegal, Lam Research, Branson/IPC, PlasmaTherm[1] | — |
| Refurbished PECVD, ALD Equipment | Cambridge, Oxford PlasmaLab , Plasma-Therm, STS/SPTS, AMAT[1] | — |
| Refurbished Mask Aligner | Canon Neutronix PLA501/545, Suss MA200CC, MA8BA8 GEN3, MA8BA8 GEN2, MA8BA8, MA200E[1] | — |
| Refurbished Bonding | SUSS SB6E, SUSS SB8E, EVG 620 BA, EVG EV501, West Bond 7200AR 7400A[1] | — |
| Refurbished Wafer Prober | Electroglas EG 4090u+, EG 4090, EG 2001X, EG 1034X, Cascade PS-21[1] | — |
| Configuration | — | CPU, Monitor, Connector, Lens holder[2] |
| Year | — | 2008[2] |
| Manufacturer | — | Hitachi[3] |
| Instrument type | — | Spectrophotometer[3] |
| Vintage | — | 2008[2] |
| Included items | — | CPU, monitor, connector, lens holder[2] |
| Monochromator | — | Diffraction grating-diffraction grating double monochromator, Seya-Namioka mount[4] |
| Wavelength range | — | 190 to 900 nm[4] |
| Spectral bandpass | — | 0.1, 0.5, 1, 2, 4, 5 nm (6 steps)[4] |
| Wavelength accuracy | — | ±0.1 nm at 656.1 nm after wavelength calibration[4] |
| Absorbance range | — | -5.5 to 5.5 Abs, 0 to 300%T[4] |
| Baseline flatness | — | Within ±0.0004 Abs[4] |
| Light source | — | WI lamp for visible range and D2 lamp for ultraviolet range[4] |
| Software | — | UV Solutions program for U-3900 in connection with PC[4] |
| OEM | — | Hitachi[2] |
| Manufactured year | — | 2008[3] |
| Control software | — | UV Solutions program for U-3900 in connection with PC[3] |