Comparison ledger
Agilent 11980 A, Rigaku TXRF 300 S, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 11980 AAgilent | TXRF 300 SRigaku |
|---|---|---|
| OEM | Agilent | Rigaku |
| Category | Precision Optics | Precision Optics |
| Wafer size | — | in-vacuum wafer robotic transfer system |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Agilent 11980 A | Rigaku TXRF 300 S |
| Specifications | ||
| Wavelength Range | 1250-1600 nm[1] | — |
| Configuration | — | XYθ sample stage[2] |
| Wafer size | — | in-vacuum wafer robotic transfer system[2] |
| Voltage | — | 200 Vac, 60A, 50Hz[2] |
| Manufacturer | — | Rigaku[2] |
| Model | — | TXRF 300 S[2] |
| Category | — | Precision Optics[3] |
| Instrument type | — | Spectrometer[3] |
| Sample stage | — | XYθ sample stage[2] |
| Transfer system | — | In-vacuum wafer robotic transfer system[2] |
| Control software | — | Windows software[2] |
| Wafer sizes | — | 6, 8, 12 inch[2] |
| Power | — | 200 Vac, 60A, 50Hz[2] |
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