Comparison ledger
Applied Materials 0010-03254 E Chuck, Lam Research Gasonics Aura 2000, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03254 E ChuckApplied Materials | Gasonics Aura 2000Lam Research |
|---|---|---|
| OEM | Applied Materials | Lam Research |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | — | Lam Research Gasonics Aura |
| Specifications | ||
| Phase | — | 3 Phase[1] |
| Frequency | — | 50 Hz[1] |
| Voltage | — | 208V[1] |
| Manufacturer | — | Lam Research[1] |
| Make | — | Lam / Novellus / Gasonics[2] |
| Model | — | Aura 2000[2] |
| Category | — | Plasma Asher Descum[3] |
| Pressure | — | 0.5 – >5.0 torr[3] |
| Platen temperature | — | 150 – 300°C[3] |
| Microwave power | — | 0 – 1000 watts at 2.45 GHz[3] |
| Lamp utilization | — | 0 – 100% (1000 watts)[3] |
| Throughput | — | 45-60 wph[3] |
| Asher rate | — | 1.5u-5u/min. positive photoresist; >8u/min. negative photoresist[3] |
| Uniformity | — | 15%, process dependent[3] |
| Particulate | — | <0.05 /cm2 (0.03um or greater)[3] |
| Damage | — | CV: <0.I V CV-shift for 250A gate oxide[3] |
| Selectivity | — | >1000:1[3] |