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0010-03485 Magnet AssyversusLHL 113 Constant Temperature

Applied Materials 0010-03485 Magnet Assy, ESPEC LHL 113 Constant Temperature, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
OEMApplied MaterialsESPEC
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
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FamilyApplied Materials 0010-03485 Magnet AssyESPEC LHL 113 Constant Temperature
Specifications
ConfigurationWP AL 300mm PVD[1]—
OEMApplied Materials[1]—
Model0010-03485[1]LHL 113[5]
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]Constant temperature and humidity chamber[6]
ProcessPVD[3]—
Wafer size300mm[4]—
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]ESPEC[5]
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
Machine type—Constant temperature machine[5]
Vintage—2010[5]
Shelf count—1[6]
Effective internal dimensions (W×D×H)—500×390×600 mm[6]
Internal volume—105 liters[6]
Power supply—Single-phase 100 V[6]
Overall dimensions (W×D×H)—650×826×1090 mm[6]
Temperature control range—5 to 85 °C[6]
Weight—95 kg[6]
Condition—Used unit sold as-is[6]
Sources (6)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]Equipment inventory listing
  6. [6]questpair.comquestpair.com