Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Olympus BX51M, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | BX51MOlympus |
|---|---|---|
| OEM | Applied Materials | Olympus |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Olympus BX51M |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | — |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | — |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | — |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Microscope | — | Metallurgical[5] |
| Optical system | — | UIS2 (Universal Infinity System)[6] |
| Viewing head | — | Trinocular[7] |
| Eyepieces | — | 10x/22mm FOV[8] |
| Nosepiece | — | 5 position[7] |
| Objectives | — | UMPLANFL 5x, 10x, 20x, 50x, 100x[7] |
| Stage | — | Mechanical XY stage[7] |
| Illumination | — | 12V 100W Halogen reflected light[9] |
| Weight | — | Approx. 15 kg[6] |