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Comparison ledger

0010-03485 Magnet Assyversus66 T Lapper

Applied Materials 0010-03485 Magnet Assy, PR Hoffman 66 T Lapper, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
66 T LapperPR Hoffman
OEMApplied MaterialsPR Hoffman
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyPR Hoffman 66 T Lapper
Specifications
ConfigurationWP AL 300mm PVD[1]Variable speed[5]
OEMApplied Materials[1]—
Model0010-03485[1]66 T[5]
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]—
ProcessPVD[3]—
Wafer size300mm[4]—
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]PR Hoffman[5]
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
Controls—sizing gage/manual/time[5]
Type—Lapper[5]
Variable speed—Yes[5]
Slurry feed—Off, auto flood[6]
Lap stop/run/start—Present[5]
Make—PR Hoffman[7]
Flood—auto flood[5]
Lap functions—stop/run/start[5]
Equipment type—Lapper[5]
Sources (7)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]inventory listing
  6. [6]waferpedia.comwaferpedia.com
  7. [7]Equipment inventory listing