Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Semitool Equinox Semiconductor Wafer Electroplating, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | |
|---|---|---|
| OEM | Applied Materials | Semitool |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Semitool Equinox |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | Single head, manual plater with one process head (100mm) and one SRD (100mm)[5] |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | Equinox Semiconductor Wafer Electroplating System[5] |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | Semitool[5] |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Voltage | — | 208V, 3 Ph, 50/60 Hz, 40A[5] |
| Process head | — | One process head (100mm)[5] |
| SRD | — | One SRD (100mm)[5] |
| Anode | — | Titanium anode[5] |
| Reactor type | — | Electroplating cup reactors for uniform films[5] |
| Load system | — | Simple manual load system[5] |
| Chambers | — | Two chambers[5] |
| Power | — | 208V, 3 Ph, 50/60 Hz, 40A[5] |
| Control | — | Computer powers on[5] |
| Condition note | — | Appears to have residual gold plating solution in the lines[5] |
| Tool type | — | Single-head manual plater[5] |