Waferpedia

Comparison ledger

0010-03485 Magnet AssyversusHL 204 P

Applied Materials 0010-03485 Magnet Assy, Trumpf HL 204 P, side by side. Every value shown is drawn from the cited encyclopedia entries.

Email
Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
HL 204 PTrumpf
OEMApplied MaterialsTrumpf
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyTrumpf HL 204 P
Specifications
ConfigurationWP AL 300mm PVD[1]with Trumpf PowerWeld[5]
OEMApplied Materials[1]Trumpf[5]
Model0010-03485[1]HL 204 P[5]
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]Laser[5]
ProcessPVD[3]—
Wafer size300mm[4]—
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]—
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
Laser type—Pulsed Nd:YAG solid-state laser[6]
Equipment number—E0551A0284[6]
Baujahr—September 2004[6]
Middle power—up to 200 W[6]
Pulse energy—up to approx. 70 J[6]
Pulse duration—0.2–20 ms (adjustable)[6]
Wavelength—1064 nm[6]
Beam delivery—via laser light cable (LLK)[6]
Cooling—Water-cooled[6]
Condition—Used, fully functional, and in good condition[6]
Sources (6)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]waferpedia.comwaferpedia.com
  6. [6]bluelasertools.debluelasertools.de