Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Ulvac CRYO U 8 HL Cryopump, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | CRYO U 8 HL CryopumpUlvac |
|---|---|---|
| OEM | Applied Materials | Ulvac |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Ulvac CRYO |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | 9.5" OD[5] |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | — |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | — |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Type | — | Cryopump[6] |
| Outside diameter | — | 9.5" OD[5] |
| Inside diameter flange | — | 8.375" ID ISO flange[5] |
| Pumping speeds at 20 degrees | — | Nitrogen 1,500 L/s; Hydrogen 2,200 L/s; Argon 1,200 L/s; Water 4,000 L/s[7] |
| Ultimate pressure | — | 10^-7 Pa (10^-9 Torr)[7] |
| Maximum throughput | — | Argon 1.2×10^3 Pa·L/s (8.9 Torr·L/s)[7] |
| Pumping capacity | — | Argon 1.6×10^8 Pa·L (1.2×10^6 Torr·L); Hydrogen 1.2×10^6 Pa·L (9.0×10^3 Torr·L)[7] |
| Cooldown time | — | 110/100 min (50/60 Hz)[7] |
| Mounting flange | — | UVG-200[7] |
| Compressor unit compatibility | — | C10, C10AT, C10ES[7] |
| Weight | — | 20 kg[7] |
| Maintenance interval | — | Every 16,000 hours[7] |