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0010-13622 RF Match forversusProducer S

Applied Materials 0010-13622 RF Match for, Applied Materials Producer S, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
0010-13622 RF Match forApplied Materials
Producer SApplied Materials
OEMApplied MaterialsApplied Materials
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones—2000 Vintage
Control system——
Generation——
FamilyApplied Materials 0010-13622 RF Match forApplied Materials Producer
Specifications
ConfigurationHigh Efficiency HE RF Match-Bias[1]TEOS[2]
Model0010-13622[1]Producer S[2]
Product TypeRF Match for PVD (Physical Vapor Deposition)[1]—
FeatureHigh Efficiency HE RF Match-Bias[1]—
Phase—3 Phase[2]
Process type—PECVD (plasma-enhanced chemical vapor deposition)[2]
Category—Deposition[3]
Wafer size—8 inch[2]
Electrical—3 phase, 3 wire & ground, 50/60 Hz, 200/208 V[2]
Make—Applied Materials[2]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]waferpedia.comwaferpedia.com