Waferpedia

Comparison ledger

0010-13627 High Efficiency RF MatchversusR 301

Applied Materials 0010-13627 High Efficiency RF Match, Seren R 301, side by side. Every value shown is drawn from the cited encyclopedia entries.

Email
Side-by-side comparison of selected equipment models
Attribute
R 301Seren
OEMApplied MaterialsSeren
CategoryLab & Support EquipmentLab & Support Equipment
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-13627 High Efficiency RF MatchSeren R 301
Specifications
ConfigurationHE, BIAS[1]Input Power:[3]
Asset Number70430[2]—
TypeHigh Efficiency RF Match - HE, BIAS[2]—
OEMApplied Materials[2]—
Model0010-13627[2]—
Output Power—300 Watts, 13.56 MHz[3]
Equipment type—RF generator[3]
Category—Lab & Support Equipment[4]
Maximum output power—300 Watts, 13.56 MHz[3]
Input power—90-140 OR 190-264 VAC[3]
Input frequency—47 - 63 Hz[3]
Maximum apparent power—750 VA Max[3]

Plan your fab

Building a Lab & Support Equipment process? Get a complete equipment list.

Open the fab equipment planner →
Sources (4)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]Equipment inventory listing
  3. [3]inventory listing
  4. [4]waferpedia.comwaferpedia.com