Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, Olympus BX51M, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | BX51MOlympus |
|---|---|---|
| OEM | Applied Materials | Olympus |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | Olympus BX51M |
| Specifications | ||
| Make | Applied Materials[1] | — |
| Model | 0010-22161[1] | — |
| Description | HTESC PH 1 REV A[2] | — |
| Condition | Used[2] | — |
| Stock Number | BM6628[2] | — |
| Microscope | — | Metallurgical[3] |
| Optical system | — | UIS2 (Universal Infinity System)[4] |
| Viewing head | — | Trinocular[5] |
| Eyepieces | — | 10x/22mm FOV[6] |
| Nosepiece | — | 5 position[5] |
| Objectives | — | UMPLANFL 5x, 10x, 20x, 50x, 100x[5] |
| Stage | — | Mechanical XY stage[5] |
| Illumination | — | 12V 100W Halogen reflected light[7] |
| Weight | — | Approx. 15 kg[4] |