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0010-22161 High EFF RF Matchversus3100

Applied Materials 0010-22161 High EFF RF Match, SCREEN 3100, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
3100SCREEN
OEMApplied MaterialsSCREEN
Category——
Wafer size——
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FamilyApplied Materials 0010-22161 High EFF RF MatchSCREEN 3100
Cited variants—
Specifications
MakeApplied Materials[3]—
Model0010-22161[3]—
DescriptionHTESC PH 1 REV A[4]—
ConditionUsed[4]—
Stock NumberBM6628[4]—
Throughput—1,000 wafers per hour[1]
Number of modules—seven independent modules[1]
Module configuration—dual cleaning baths built into a single compact module[1]
Drying system—Low Pressure Drying System (HiLPD)[1]
Drying method—high concentration IPA vapor without carrier N2 gas[1]
Sources (4)Every fact above is drawn from these public sources
  1. [1]screen.co.jpscreen.co.jp
  2. [2]Equipment inventory listing
  3. [3]Equipment inventory listing
  4. [4]tarasemi.comtarasemi.com