Waferpedia

Comparison ledger

0020 17484 PartversusPECVD3

Applied Materials 0020 17484 Part, Oxford Instruments PECVD3, side by side. Every value shown is drawn from the cited encyclopedia entries.

Email
Side-by-side comparison of selected equipment models
Attribute
0020 17484 PartApplied Materials
PECVD3Oxford Instruments
OEMApplied MaterialsOxford Instruments
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 17484 PartOxford Instruments PECVD3
Specifications
ConfigurationBar, Cap Bank, Hdpcvd 300mm Ultima X[1]—
OEM—Oxford Instruments[2]
Model—PECVD3[2]
Equipment listing—Oxford Plasmalab System 100 PECVD System[2]
Process manual reference—PECVD Overview from Oxford Instruments[3]
Process specification—Oxford PECVD3 - SiOx[2]

Plan your fab

Building a Deposition process? Get a complete equipment list.

Open the fab equipment planner →
Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]nanolab.berkeley.edunanolab.berkeley.edu
  3. [3]nanolab.berkeley.edunanolab.berkeley.edu