Waferpedia

Comparison ledger

0020 17485 PartversusCentura 1 P 2

Applied Materials 0020 17485 Part, Applied Materials Centura 1 P 2, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
0020 17485 PartApplied Materials
Centura 1 P 2Applied Materials
OEMApplied MaterialsApplied Materials
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 17485 PartApplied Materials Centura
Specifications
ConfigurationStrap, RF Out 2 Balanced Coil Match, Hdp[1]Refurbished[2]
Voltage—208 Vac[2]
Frequency—60 Hz[2]
Phase—3 Phase[2]
Full Load Current—600 A[2]
Chamber—6 inch EMXP plus oxide chamber[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing