Waferpedia

Comparison ledger

0020 18698 PartversusConcept Two Altus Shrink

Applied Materials 0020 18698 Part, Lam Research Concept Two Altus Shrink, side by side. Every value shown is drawn from the cited encyclopedia entries.

Email
Side-by-side comparison of selected equipment models
Attribute
0020 18698 PartApplied Materials
OEMApplied MaterialsLam Research
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 18698 PartLam Research Concept Two Altus Shrink
Specifications
ConfigurationDial Cover, Side Local Match, Hdpcvd, Ul[1]—
OEM—Lam Research[2]
Model—Concept Two Altus Shrink[3]
Process—Chemical Vapor Deposition (CVD)[3]
Wafer size—8 inch[3]

Plan your fab

Building a Deposition process? Get a complete equipment list.

Open the fab equipment planner →
Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]Equipment inventory listing