Comparison ledger
Applied Materials VIISta HCP+ High Current, Varian 160 XP, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | VIISta HCP+ High CurrentApplied Materials | 160 XPVarian |
|---|---|---|
| OEM | Applied Materials | Varian |
| Category | Ion Implantation | Ion Implantation |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials VIISta HCP+ High Current | Varian 160 XP |
| Cited variants | — |
|
| Specifications | ||
| Process Type | High Current Implanter[2] | — |
| Wafer Size | 300 mm[2] | — |
| Manufacturing Year | 2006[3] | — |
| Manufacturing Date | 01.10.2007[2] | — |
| Configuration (160 XP Ion variant) | — | 150mm High Current IMP[1] |
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