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200 PCU Photoresist StabilizerversusRF 300 A Photo Track

Axcelis 200 PCU Photoresist Stabilizer, SCREEN RF 300 A Photo Track, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
OEMAxcelisSCREEN
CategoryResist ProcessingResist Processing
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAxcelis NV GSD 200SCREEN RF 300 A Photo Track
Specifications
Configuration14 Amps[1]Modifications:[4]
Voltage380 V[1]—
Frequency50 Hz[1]—
Phase3 Phase[1]—
ManufacturerAxcelis[3]—
Model200 PCU[3]RF 300 A[4]
Tool typephotoresist stabilizer[3]—
CategoryResist Processing[3]—
Power14 Amps[1]—
Robot Change—IHU, MHU (2), BHU[4]
Bake—CP (6), FRHP (7)[4]
Make—SCREEN / DNS[4]
Modifications—Robot Change: IHU, MHU (2), BHU; Bake: CP (6), FRHP (7); Loadport (10); Cleanbooth; SC Cup Parts (2) (change and retrofit); SD Cup Parts, Nozzle (2) (change and retrofit); 10 L Nowpack Cabinet; ETU-Cab; Resist 8 High Viscosity (140 cp); Low Height Mod (Top Module Separation); BARC/Resist Separation Drain; Facility Connection Parts (change and retrofit); Power BOX Mod Parts (change and retrofit); Fire Suppression[4]
Resist 8 High Viscosity—140 cp[5]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]waferpedia.comwaferpedia.com
  4. [4]inventory listing
  5. [5]waferpedia.comwaferpedia.com