Waferpedia

Comparison ledger

100 Spinversus8626

CEE 100 Spin, SVG 8626, side by side. Every value shown is drawn from the cited encyclopedia entries.

Email
Side-by-side comparison of selected equipment models
Attribute
8626SVG
OEMCEESVG
CategoryResist ProcessingResist Processing
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyCEE 100SVG 8626
Specifications
ConfigurationVolts 115[1]Cassette to cassette[2]
OEM—SVG[2]
Model—8626[2]
Wafer size—6 inch[2]
Coat stages—2 coat[2]
Excludes—Pumps[2]
Process—2 coat[2]
Includes—Excludes pumps[2]
Facility equipment listing—SVG 8626 6" Lift-Off resist and BARC Coat Track[3]

Plan your fab

Building a Resist Processing process? Get a complete equipment list.

Open the fab equipment planner →
Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]nanolab.berkeley.edunanolab.berkeley.edu