Comparison ledger
KLA 1.112 PSL Wafer, Nikon Eclipse L 200 D, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Eclipse L 200 DNikon | |
|---|---|---|
| OEM | KLA | Nikon |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA 1.112 PSL Wafer | Nikon Eclipse L 200 D |
| Specifications | ||
| Configuration | NIST Traceable[1] | — |
| Wafer Size | 8 inch[1] | — |
| NIST Traceable | True[1] | — |
| Compatible Tools | Surfscan 6xy0 and Sp1[2] | — |
| Power | — | 100–240 VAC[3] |
| Current | — | 2.4 A[3] |
| Frequency | — | 50/60 Hz[3] |
| Make | — | Nikon[4] |
| Model | — | Eclipse L 200 D[4] |
| Equipment type | — | Inspection Microscope[4] |
| Category | — | Metrology & Inspection[3] |
| Wafer size | — | 8 inch[4] |
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