Comparison ledger
KLA .498 PSL Wafer, KLA eV 300, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | eV 300KLA | |
|---|---|---|
| OEM | KLA | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA .498 PSL Wafer | KLA eV 300 |
| Specifications | ||
| Configuration | NIST Traceable[1] | Main body[2] |
| NIST traceability | Yes[1] | — |
| OEM | KLA[1] | — |
| Category | Metrology & Inspection[1] | — |
| Traceability | Yes[1] | — |
| Description | Particle-sizing calibration standard[1] | — |
| Manufacturer | — | KLA[2] |
| Model | — | eV 300[2] |
| Tool type | — | Scanning Electron Microscope (SEM)[3] |
| Function | — | Defect review and analysis[3] |
| Automation | — | Fully automated[3] |
| Wafer handling | — | 150 mm, 200 mm, or 300 mm wafers[3] |
| Landing energy | — | Up to 19 keV[3] |
| Automatic defect classification | — | Supported[3] |
| Tilt and rotation | — | Supported[3] |
| High aspect ratio interconnect imaging | — | Supported[3] |
| Application range | — | In-line monitoring and engineering analysis[3] |
| Technology node | — | 0.13 micron and smaller[3] |
| Productivity | — | Four-fold increase versus manual SEM review systems[3] |
| Elemental analysis option | — | Oxford EDX detector[4] |
| Main body | — | Included[2] |
| Power unit | — | Included[2] |
| Display unit | — | Included[2] |
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