Comparison ledger
KLA .498 PSL Wafer, KLA OP 2600 DUV Film Thickness Measurement, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | ||
|---|---|---|
| OEM | KLA | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | 1997 Vintage |
| Control system | — | — |
| Generation | — | — |
| Family | KLA .498 PSL Wafer | KLA OP 2600 |
| Specifications | ||
| Configuration | NIST Traceable[1] | UV block is missing[2] |
| NIST traceability | Yes[1] | — |
| OEM | KLA[1] | — |
| Category | Metrology & Inspection[1] | — |
| Traceability | Yes[1] | — |
| Description | Particle-sizing calibration standard[1] | — |
| Manufacturer | — | KLA / Therma-wave[3] |
| Model | — | OP 2600 DUV[3] |
| Equipment type | — | Film Thickness Measurement[3] |
| Vintage | — | 1997[3] |
| Missing component | — | UV block[3] |
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