Comparison ledger
Nikon 1505 G 6 E, Nikon S 308 F, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1505 G 6 ENikon | S 308 FNikon |
|---|---|---|
| OEM | Nikon | Nikon |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | 1988– | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon 1505 | Nikon S 308 F |
| Specifications | ||
| Configuration | 5" reticle[1] | HDD included[4] |
| Resolution | 650 nm[2] | <65 nm[5] |
| Numerical Aperture | 0.54[2] | — |
| Reduction | 5x[2] | — |
| Exposure Field | 15 x 15 mm[2] | — |
| Alignment Accuracy | 130 nm[2] | — |
| Wafer Size | 4 inch[1] | — |
| Light Source | g-line[3] | — |
| Introduction Year | 1988[2] | — |
| NA (Numerical Aperture) | 0.54[2] | — |
| Make | Nikon[1] | — |
| Model | 1505 G 6 E[1] | — |
| Category | Stepper[1] | — |
| Wafer Sizes | 4 inch[1] | — |
| Exposure type | g-line[2] | — |
| NA | 0.54[2] | — |
| Exposure field | 9.3 x 18.8 mm[2] | — |
| Light source | — | ArF (193 nm)[5] |
| Numerical aperture | — | 0.92[5] |
| Exposure area | — | 26 x 33 mm[5] |
| Reduction ratio | — | 1:4[5] |
| Throughput (300 mm) | — | >145 wph[5] |
| Throughput (200 mm) | — | >165 wph[5] |
| Wafer size | — | 200/300 mm[5] |
| Overlay accuracy | — | 8 nm[5] |
| Polarization control | — | POLANO[5] |
| Wafer size (alternative) | — | 12 inch[4] |
| Wavelength | — | 193 nm[5] |
| Lens NA | — | 0.92[5] |
| Polarization Control | — | POLANO (optional)[5] |
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