Comparison ledger
Nikon NSR SF 140 i-Line, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | NSR SF 140 i-LineNikon | 150 e MaskSUSS MicroTec |
|---|---|---|
| OEM | Nikon | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon NSR | SUSS MicroTec 150 e Mask |
| Cited variants |
| — |
| Specifications | ||
| Configuration | With HDD[2] | — |
| Manufacturer | Nikon[2] | — |
| Model | NSR SF 140[2] | — |
| Equipment type | Stepper[1] | — |
| Application | Semiconductor lithography[1] | — |
| Wafer size | 12 inch[2] | — |
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