Comparison ledger
OAI 650 S Flat Panel Exposure, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 150 e MaskSUSS MicroTec | |
|---|---|---|
| OEM | OAI | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | OAI 650 S Flat Panel Exposure | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Configuration | 20" panel[1] | — |
| OEM | OAI[1] | — |
| Model | 650 S[1] | — |
| Equipment type | Flat Panel Exposure System[1] | — |
| Panel capacity | 20-inch panel[1] | — |
| Substrate capacity | Substrates up to 20 inches square[2] | — |
| Originally for | Flat panel display substrates[2] | — |
| Supported smaller mask sizes | 4-inch and 6-inch rounds, 5-inch square[2] | — |
| Feature size | Below 2 μm[2] | — |
| Line width | ~ 1.5 μm[2] | — |
| Lamp installed | Used 2000W lamp installed; one spare[2] | — |
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