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MP 30 Wet Processversus11600 SRD

SCREEN MP 30 Wet Process, Semitool 11600 SRD, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
MP 30 Wet ProcessSCREEN
11600 SRDSemitool
OEMSCREENSemitool
CategoryWet Processing / CleanWet Processing / Clean
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilySCREEN MP 30 Wet ProcessSemitool 11600 SRD
Specifications
ManufacturerSCREEN[1]Semitool[3]
ModelMP 30[1]11600 SRD[3]
Equipment nameMP 30 Wet Process[2]—
CategoryWet Processing / Clean[2]—
Configuration—Ceramic[3]
Equipment type—Spin Rinse Dryer[3]
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Sources (3)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]inventory listing