Comparison ledger
SUSS MicroTec 150 e Mask, Ultratech AP300, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 150 e MaskSUSS MicroTec | AP300Ultratech |
|---|---|---|
| OEM | SUSS MicroTec | Ultratech |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | 2004 |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | SUSS MicroTec 150 e Mask | Ultratech AP300 |
| Specifications | ||
| Type | — | lithography system[1] |
| Application | — | advanced packaging[1] |
| Platform | — | Unity Platform[1] |
| Introduction | — | mid-2004[1] |
| Category | — | Photolithography, Semiconductor Fabrication, Steppers[2] |
| Wafer size | — | 300mm[2] |
| Vintage | — | 2009[2] |
| AP line use | — | Advanced packaging[1] |
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