Waferpedia

Comparison ledger

8626versus8626 Photoresist

SVG 8626, SVG 8626 Photoresist, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
8626SVG
OEMSVGSVG
CategoryResist ProcessingResist Processing
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilySVG 8626SVG 8626
Specifications
ConfigurationCassette to cassette[1]Cassette to cassette[3]
OEMSVG[1]SVG[3]
Model8626[1]8626[3]
Wafer size6 inch[1]—
Coat stages2 coat[1]—
ExcludesPumps[1]—
Process2 coat[1]—
IncludesExcludes pumps[1]—
Facility equipment listingSVG 8626 6" Lift-Off resist and BARC Coat Track[2]—
Wafer Size—6 inch[3]
Number of Coats—2 coat[3]
Pumps—Excluded[3]
Track Type—Dual track[4]
Hotplates—Included[4]
Equipment type—Photo Resist Coaters[4]
Wafer sizes—6 inch[3]
Coat count—2 coat[3]
Description—Dual Track Photoresist Coater With Hotplates[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]nanolab.berkeley.edunanolab.berkeley.edu
  3. [3]inventory listing
  4. [4]jmind.comjmind.com