Comparison ledger
ABM 3 HR Mask Aligner UV Exposure, Nikon 1505 G 6 E, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1505 G 6 ENikon | |
|---|---|---|
| OEM | ABM | Nikon |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | 1988– |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ABM 3 HR Mask Aligner UV Exposure | Nikon 1505 |
| Specifications | ||
| Configuration | Precision alignment stage[1] | 5" reticle[3] |
| Mask Holder | 4” x 4” with 3” diameter substrate holder[1] | — |
| Voltage | 120V, 50/60 Hz.[1] | — |
| Power | 120V, 50/60 Hz[1] | — |
| Performance | Precision alignment stage[1] | — |
| Substrate size compatibility | Chuck and mask holder available for 2" substrates[1] | — |
| Substrate size limitation | System will not do larger substrates[1] | — |
| Optics | Exposure timer[2] | — |
| Imaging | Splitfield Zeiss microscope for easier alignment[1] | — |
| Resolution | — | 650 nm[4] |
| Numerical Aperture | — | 0.54[4] |
| Reduction | — | 5x[4] |
| Exposure Field | — | 15 x 15 mm[4] |
| Alignment Accuracy | — | 130 nm[4] |
| Wafer Size | — | 4 inch[3] |
| Light Source | — | g-line[5] |
| Introduction Year | — | 1988[4] |
| NA (Numerical Aperture) | — | 0.54[4] |
| Make | — | Nikon[3] |
| Model | — | 1505 G 6 E[3] |
| Category | — | Stepper[3] |
| Wafer Sizes | — | 4 inch[3] |
| Exposure type | — | g-line[4] |
| NA | — | 0.54[4] |
| Exposure field | — | 9.3 x 18.8 mm[4] |
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