ABM
3 HR Mask Aligner UV Exposure
The ABM 3 HR Mask Aligner UV Exposure is a lithography tool used for mask alignment and ultraviolet exposure in microfabrication. The ABM 3 HR Mask Aligner UV Exposure has a precision alignment stage. The ABM 3 HR Mask Aligner UV Exposure has a 4 inch by 4 inch mask holder with a 3 inch diameter substrate holder.[1][2]
What it is
The ABM 3 HR Mask Aligner UV Exposure is a lithography tool used for mask alignment and ultraviolet exposure in microfabrication. The ABM 3 HR Mask Aligner UV Exposure System has a precision alignment stage. The ABM 3 HR Mask Aligner UV Exposure System has a splitfield Zeiss microscope for alignment.[1][2][3]
How it works
The ABM 3 HR Mask Aligner UV Exposure System is configured with a mask holder sized for 4” x 4” with a 3” diameter substrate holder. The ABM 3 HR Mask Aligner UV Exposure System has an exposure timer. The ABM 3 HR Mask Aligner UV Exposure System has a chuck and mask holder available for 2" substrates. The ABM 3 HR Mask Aligner UV Exposure System will not do larger substrates.[2][1][3]
Where it fits in the process flow
General reference — not yet source-verifiedMask aligners sit in the lithography portion of a fabrication flow after a substrate has been coated with a light-sensitive film and before development. Mask aligners are used when a process requires direct registration between a mask and a substrate.
Applications
General reference — not yet source-verifiedMask aligners are used for pattern transfer on photosensitive substrates in microfabrication. Mask aligners are used in semiconductor work, micromechanical device fabrication, and other planar processes that require repeatable mask-to-substrate registration during ultraviolet exposure.
What do the numbers mean?
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What type of equipment is the ABM 3 HR Mask Aligner UV Exposure?
The ABM 3 HR Mask Aligner UV Exposure is a lithography tool used for mask alignment and ultraviolet exposure in microfabrication.[1]
What alignment optics does the ABM 3 HR Mask Aligner UV Exposure use?
The ABM 3 HR Mask Aligner UV Exposure System has a splitfield Zeiss microscope for alignment.[2][1][3]
Not publicly documented
The following facts about the 3 HR Mask Aligner UV Exposure are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 3 HR Mask Aligner UV Exposure are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 3 HR Mask Aligner UV Exposure are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 3 HR Mask Aligner UV Exposure are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 3 HR Mask Aligner UV Exposure are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 3 HR Mask Aligner UV Exposure is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]waferpedia.com — waferpedia.comwaferpedia.com
- [2]inventory listing
- [3]ABM 3 HR Mask Aligner UV Exposure family | Waferpedia — waferpedia.comwaferpedia.com
Last updated Oct 19, 2026.
Compare with similar tools
View all →Brooks 017-0146-01 is a prealigner manufactured by Brooks.
The Ultratech 1000 Family is a photolithography step-and-repeat 1X steppers family using the Wynne Dyson optical design.
The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.
