Comparison ledger
ABM 3 HR Mask Aligner UV Exposure, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 150 e MaskSUSS MicroTec | |
|---|---|---|
| OEM | ABM | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ABM 3 HR Mask Aligner UV Exposure | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Configuration | Precision alignment stage[1] | — |
| Mask Holder | 4” x 4” with 3” diameter substrate holder[1] | — |
| Voltage | 120V, 50/60 Hz.[1] | — |
| Power | 120V, 50/60 Hz[1] | — |
| Performance | Precision alignment stage[1] | — |
| Substrate size compatibility | Chuck and mask holder available for 2" substrates[1] | — |
| Substrate size limitation | System will not do larger substrates[1] | — |
| Optics | Exposure timer[2] | — |
| Imaging | Splitfield Zeiss microscope for easier alignment[1] | — |
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