Comparison ledger
Accretech , Tokyo Semitsu Kogaku (TSK) UF200, Filmetrics F10-RT, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | , Tokyo Semitsu Kogaku (TSK) UF200Accretech | F10-RTFilmetrics |
|---|---|---|
| OEM | Accretech | Filmetrics |
| Category | — | — |
| Wafer size | Wafer Equipment | 6" |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Accretech , Tokyo Semitsu Kogaku (TSK) UF200 | Filmetrics F10-RT |
| Specifications | ||
| Wafer size | Wafer Equipment[1] | — |
| Date of Manufacture | 1998[1] | — |
| Currently Configured for | 200mm[1] | — |
| Current Equipment Status | Available[1] | — |
| Available date | Currently Available[1] | — |
| Equipment category | Production Wafer Prober[1] | — |
| Instrument type | — | optical spectrometer[2] |
| Use in source example | — | measured reflectivity of a 9-period SiO2/Ta2O5 DBR[3] |
| Example measurement wavelength | — | high reflectivity at approximately 1050 nm[3] |
| Alternate name | — | F10RT[2] |
| Measurement capability | — | Reflectivity[3] |