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11980 A Fiber OpticversusNanospec 210 Thin Film Measurement

Agilent 11980 A Fiber Optic, Onto Innovation Nanospec 210 Thin Film Measurement, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
OEMAgilentOnto Innovation
CategoryPrecision OpticsPrecision Optics
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAgilent 11980 A Fiber OpticOnto Innovation Nanospec 210 Thin Film Measurement
Specifications
Configuration1250-1600nm[1]—
Wavelength Range1250-1600nm[1]—
Manufacturer—Onto Innovation[2]
Model—Nanospec 210[2]
Equipment type—Thin film measurement system[2]
Thickness range—100 to 500,000 angstroms[3]
Typical measurement time—2.5 seconds[3]
Spot size—50 um with 5x objective; 25 um with 10x objective; 6.5 um with 40x objective[3]
Film types measured—Oxide on Silicon; Nitride on Silicon; Negative Resist on Silicon; Polysilicon on Oxide; Negative Resist on Oxide; Nitride on Oxide; Polyimide on Silicon; Positive Resist on Silicon; Positive Resist on Oxide[3]
Reflectance mode—Thick Films[3]
Reproducibility—5A ± 5% depending upon the film type[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]tech-semi.comtech-semi.com