Onto Innovation
Nanospec 210 Thin Film Measurement
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Nanospec 210 Thin Film Measurement is a thin film measurement system. The Nanospec 210 Thin Film Measurement is used in semiconductor process control.[1]
How it works
The Nanospec 210 has a thickness measurement range of 100 to 500,000 angstroms. The Nanospec 210 has a typical measurement time of 2.5 seconds. The Nanospec 210 has a spot size of 50 um with a 5x objective, 25 um with a 10x objective, and 6.5 um with a 40x objective. The Nanospec 210 includes a reflectance mode for thick films. The Nanospec 210 has reproducibility of 5A ± 5% depending upon the film type.[3]
Where it fits in the process flow
The Onto Innovation Nanospec 210 is used in semiconductor process control.[1]
Applications
The Nanospec 210 measures oxide on silicon, nitride on silicon, negative resist on silicon, polysilicon on oxide, negative resist on oxide, nitride on oxide, polyimide on silicon, positive resist on silicon, and positive resist on oxide. The Nanospec 210 uses reflectance mode for thick films.[3]
What do the numbers mean?
Gas & chemistry1
- Film types measured
- Oxide on Silicon; Nitride on Silicon; Negative Resist on Silicon; Polysilicon on Oxide; Negative Resist on Oxide; Nitride on Oxide; Polyimide on Silicon; Positive Resist on Silicon; Positive Resist on Oxide[3]
Optics & imaging1
Configuration & options7
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Film types measuredOxide on Silicon; Nitride on Silicon; Negative Resist on Silicon; Polysilicon on Oxide; Negative Resist on Oxide; Nitride on Oxide; Polyimide on Silicon; Positive Resist on Silicon; Positive Resist on Oxide[3]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
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Frequently asked questions
Not publicly documented
The following facts about the Nanospec 210 Thin Film Measurement are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Nanospec 210 Thin Film Measurement are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Nanospec 210 Thin Film Measurement are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Nanospec 210 Thin Film Measurement are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Nanospec 210 Thin Film Measurement are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Nanospec 210 Thin Film Measurement is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]waferpedia.com — waferpedia.comwaferpedia.com
- [2]Inventory photo
- [3]tech-semi.com — tech-semi.comtech-semi.com
Last updated Oct 20, 2026.
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