Comparison ledger
Agilent 11980 A, Filmetrics Profilm3D, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 11980 AAgilent | Profilm3DFilmetrics |
|---|---|---|
| OEM | Agilent | Filmetrics |
| Category | Precision Optics | Precision Optics |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Agilent 11980 A | Filmetrics Profilm3D |
| Cited variants | — |
|
| Specifications | ||
| Wavelength Range | 1250-1600 nm[2] | — |
| manufacturer | — | Filmetrics[3] |
| model | — | Profilm3D[3] |
| instrument type | — | optical profiler[3] |
| measurement method | — | profilometry[3] |
| step-height accuracy | — | 0.7% for an 8 µm step[3] |
| maximum silicon thickness stated on source page for tabletop/mapping/production systems | — | up to 2 mm thick[3] |
| Instrument type | — | White light interferometry-based 3D optical profilometer[1] |
| Measurement modes | — | Vertical scanning interferometry and phase shifting interferometry[1] |
| Thickness range, WLI | — | 50nm - 10mm[4] |
| Thickness range, PSI | — | 0 - 3μm[4] |
| Step-height accuracy | — | 0.7%[4] |
| Step-height precision | — | 0.1%[4] |
| Step-height stability | — | 0.15%[4] |
| X-Y stage travel, Profilm3D | — | 100mm x 100mm[1] |
| X-Y stage travel, Profilm3D-200 | — | 200mm x 200mm[1] |
| Z stage range | — | 100mm[1] |
| Piezo range | — | 500μm[4] |
| Objective magnifications | — | 5X, 10X, 20X, 50X, 100X[4] |
| Field of view at 1X zoom | — | 4.0mm x 3.4mm at 5X, 2.0mm x 1.7mm at 10X, 1.0mm x 0.85mm at 20X, 0.4mm x 0.34mm at 50X, 0.2mm x 0.17mm at 100X[4] |
| Working distance | — | 9.3mm at 5X, 7.4mm at 10X, 4.7mm at 20X, 3.4mm at 50X, 2.2mm at 100X[4] |
| Sample max width | — | 265mm for Profilm3D; 365mm for Profilm3D-200[4] |
| Sample max weight | — | 2.5kg[4] |
| Sample reflectance range | — | 0.05% - 100%[4] |
| Camera | — | 2592 x 1944 (5 megapixels)[4] |
| Measurement principle | — | White light interferometry (WLI)[1] |
| Surface topography resolution | — | Sub-nanometer-level resolution[1] |
| Step height range | — | Nanometers to millimeters[1] |
| X-Y stage travel | — | 100mm by 100mm for Profilm3D[1] |
| Manual tip/tilt stage | — | ±5° of motion[1] |
| Objective lens range | — | 5X to 100X[1] |
| Wafer stage support | — | Manual R-theta wafer stage supporting 50mm- to 200mm-diameter wafers[1] |
| Profilm3D-200 X-Y stage travel | — | 200mm by 200mm[1] |
| Applications | — | Step height, texture and form, edge rolloff, defect review, high resolution scans over large transparent film surfaces, and high roughness or low reflectivity surfaces[1] |
| Application examples | — | Universities, research labs and institutes; silicon and compound semiconductor; precision optics and mechanics; medical devices; LED; power devices; MEMS; data storage; automotive[1] |
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