Comparison ledger
Agilent 11980 A, Onto Innovation Nanospec 210 Thin Film Measurement, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 11980 AAgilent | Nanospec 210 Thin Film MeasurementOnto Innovation |
|---|---|---|
| OEM | Agilent | Onto Innovation |
| Category | Precision Optics | Precision Optics |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Agilent 11980 A | Onto Innovation Nanospec 210 Thin Film Measurement |
| Specifications | ||
| Wavelength Range | 1250-1600 nm[1] | — |
| Manufacturer | — | Onto Innovation[2] |
| Model | — | Nanospec 210[2] |
| Equipment type | — | Thin film measurement system[2] |
| Thickness range | — | 100 to 500,000 angstroms[3] |
| Typical measurement time | — | 2.5 seconds[3] |
| Spot size | — | 50 um with 5x objective; 25 um with 10x objective; 6.5 um with 40x objective[3] |
| Film types measured | — | Oxide on Silicon; Nitride on Silicon; Negative Resist on Silicon; Polysilicon on Oxide; Negative Resist on Oxide; Nitride on Oxide; Polyimide on Silicon; Positive Resist on Silicon; Positive Resist on Oxide[3] |
| Reflectance mode | — | Thick Films[3] |
| Reproducibility | — | 5A ± 5% depending upon the film type[3] |
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