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Comparison ledger

G 4 MOCVDversus0020 17484 Part

Aixtron G 4 MOCVD, Applied Materials 0020 17484 Part, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
G 4 MOCVDAixtron
0020 17484 PartApplied Materials
OEMAixtronApplied Materials
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAixtron G 4 MOCVDApplied Materials 0020 17484 Part
Specifications
Voltage208V[1]—
Phase3 Phase[1]—
ProcessEPI[1]—
Process gassesNH3, H2, SiH4[1]—
ConfigurationWith:[1]Bar, Cap Bank, Hdpcvd 300mm Ultima X[3]
ManufacturerAixtron[1]—
ModelG 4[1]—
Wafer size4 inch[1]—
Process gasesNH3, H2, SiH4[1]—
Power208V[2]—
Electrical phase3 Phase[2]—
VacuumMain pump[2]—
Included itemsGlove box, GMS, main pump, particle filter, cable box, RF generator, transformer[1]—

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]inventory listing