Comparison ledger
AJA ATC 1500 F, Applied Materials 0010-13622 RF Match for, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | ATC 1500 FAJA | 0010-13622 RF Match forApplied Materials |
|---|---|---|
| OEM | AJA | Applied Materials |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | AJA ATC | Applied Materials 0010-13622 RF Match for |
| Specifications | ||
| Configuration | Substrate size up to 3”[1] | High Efficiency HE RF Match-Bias[3] |
| Tool type | sputter coater[1] | — |
| Category | Deposition[2] | — |
| Substrate size | up to 3 inches[1] | — |
| Targets | 4[1] | — |
| Power supply | Kurt J Lesker R301 RF Power Supply[1] | — |
| Vacuum gauge controller | Granville-Phillips Series 307 Vacuum Gauge Controller[2] | — |
| Matching network controller | SEREN MC2 Matching Network Controller[1] | — |
| Magnetron drive | Advanced Energy MDX500 Magnetron Drive (2x)[1] | — |
| Automatic matching network | SEREN AT-3 Automatic Matching network[1] | — |
| Pump controller | Pfeiffer pump controller DCU (2x)[1] | — |
| Vacuum pumps | not included[1] | — |
| Magnetic manipulator | included[1] | — |
| Model | — | 0010-13622[3] |
| Product Type | — | RF Match for PVD (Physical Vapor Deposition)[3] |
| Feature | — | High Efficiency HE RF Match-Bias[3] |
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