AJA
ATC 1500 F
The AJA ATC 1500 F is a sputter coater. The AJA ATC 1500 F is categorized as deposition equipment. The AJA ATC 1500 F supports substrate size up to 3 inches.[1][2]
What it is
How it works
The AJA ATC 1500 F includes a Kurt J Lesker R301 RF Power Supply. The AJA ATC 1500 F includes an MKS Baratron Type 627B. The AJA ATC 1500 F includes a Granville-Phillips Series 307 Vacuum Gauge Controller. The AJA ATC 1500 F includes a magnetic manipulator. The AJA ATC 1500 F includes 2 Advanced Energy MDX500 Magnetron Drives. The AJA ATC 1500 F includes a SEREN AT-3 Automatic Matching network. The AJA ATC 1500 F includes a SEREN MC2 Matching Network Controller. The AJA ATC 1500 F includes 2 Pfeiffer pump controllers DCU. The AJA ATC 1500 F does not include vacuum pumps.[1][2]
Where it fits in the process flow
General reference — not yet source-verifiedDeposition tools are used after substrate preparation when a process flow needs a new film added rather than material removed. Deposition by sputtering is commonly followed by patterning, etch, lift off, anneal, inspection, or metrology, depending on the device and the film stack.
Applications
General reference — not yet source-verifiedSputter coaters are used to deposit conductive, barrier, adhesion, and other functional thin films in microfabrication and related laboratory process work. Sputter deposition is commonly chosen for metal film formation, contact layers, seed layers, and stack development where vacuum deposited coatings are required.
What do the numbers mean?
Power & electrical2
- Kurt J Lesker R301 RF Power Supply[1]
Vacuum & pumping6
Wafer handling2
- Substrate size up to 3”[1]
Control & software2
- SEREN MC2 Matching Network Controller[1]
Configuration & options11
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- ConfigurationKurt J Lesker R301 RF Power Supply[1]
- ConfigurationGranville-Phillips Series 307 Vacuum Gauge Controller[1]
- ConfigurationPfeiffer pump controller DCU (2x)[1]
- ConfigurationVacuum pumps not included[1]
- Power supplyKurt J Lesker R301 RF Power Supply[1]
- Vacuum gauge controllerGranville-Phillips Series 307 Vacuum Gauge Controller[2]
- Pump controllerPfeiffer pump controller DCU (2x)[1]
- Vacuum pumpsnot included[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What type of equipment is the AJA ATC 1500 F?
The AJA ATC 1500 F is a sputter coater in the deposition category.[1][2]
What substrate size does the AJA ATC 1500 F support?
The AJA ATC 1500 F supports substrate sizes up to 3 inches.[1][2]
Not publicly documented
The following facts about the ATC 1500 F are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the ATC 1500 F are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the ATC 1500 F are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the ATC 1500 F are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the ATC 1500 F are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the ATC 1500 F is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]waferpedia.com — waferpedia.comwaferpedia.com
Last updated Oct 16, 2026.
Compare with similar tools
View all →
The Applied Materials 0010-13622 is an RF match unit intended for PVD (Physical Vapor Deposition) described as a High Efficiency HE RF Match-Bias.
The Applied Materials 0020 12458 Part is an insulator, side match component for the Hdp-Cvd Ultima Plus system.