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ATC 2036 Eversus0020 17484 Part

AJA ATC 2036 E, Applied Materials 0020 17484 Part, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
0020 17484 PartApplied Materials
OEMAJAApplied Materials
CategoryDepositionDeposition
Wafer size15-20” adjustable length from source to wafer—
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAJA ATCApplied Materials 0020 17484 Part
Cited variants
  • ATC 2030-E HV[1]
  • ATC 2036-E HV[1]
—
Specifications
Wafer size15-20” adjustable length from source to wafer[2]—
ConfigurationTemescal Multu-Pocket Rotary E-Beam Source[2]Bar, Cap Bank, Hdpcvd 300mm Ultima X[4]
Chamber FrontDouble hinged door with locking mechanism[2]—
ModelATC 2036 E[2]—
CategoryDeposition[3]—
Source-to-wafer length15-20 inch adjustable[3]—
Evaporation sourceTemescal Multu-Pocket Rotary E-Beam Source[2]—
Deposition controllerQuartz Crystal Deposition Controller[2]—
Substrate holderWater Cooled Substrate Holder[2]—
Load-lockLoad-Lock[2]—
Chamber dimensionsNominal 36" high x 20" depth x 20" wide[2]—
Chamber constructionFlat front; S/S vacuum chamber[2]—
Vacuum gauge packageVacuum Gauge Package with Cables[2]—
Vacuum pumpingBrooks Cryo-Torr 8 straight cryo-pump with compressor (Model: 8200, water cooled); 16 cfm Pfeiffer (Adixen / ACP) dry, lobe type backing pump with fast acting inlet valve; AJA automated pumping system controlled and displayed via Touch Screen Controller[2]—
Source type6 pocket rotary e-beam source[1]—
Substrate heating1000°C substrate heating[1]—
Substrate shutterProgrammable linear substrate shutter for wedge films[1]—
Spare16 cfm Pfeiffer (Adixen / ACP) Dry, lobe type backing pump with fast acting inlet valve for power failure[2]—

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Sources (4)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]inventory listing
  3. [3]waferpedia.comwaferpedia.com
  4. [4]inventory listing