Comparison ledger
Applied Materials 0010-03254 E Chuck, CEE Apogee Spin, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03254 E ChuckApplied Materials | Apogee SpinCEE |
|---|---|---|
| OEM | Applied Materials | CEE |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | — | CEE Apogee |
| Specifications | ||
| Configuration | — | Polymide[1] |
| OEM | — | CEE[1] |
| Model | — | Apogee[1] |
| Equipment name | — | CEE Apogee Spin Coater[2] |
| Installed modules | — | Spin coater, bake plate, and vapor primer bake plate[3] |
| Spin chuck type | — | Circular vacuum chucks[3] |
| Recommended substrate size range for 4-inch chuck | — | 5 inches to 8 inches in diameter (125 mm to 200 mm)[3] |
| Spin coater standard substrate thickness | — | 275-750 μm[3] |
| Maximum recommended spin speed and acceleration range | — | 3,000 to 6,000 rpm for standard thickness substrates[3] |
| Bake plate holding temperature | — | 115 degrees C[3] |
| Vapor HMDS bake plate holding temperature | — | 100 degrees C[3] |