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0010-03254 E ChuckversusScientific FEI Helios 1200

Applied Materials 0010-03254 E Chuck, Thermo Fisher Scientific FEI Helios 1200, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
0010-03254 E ChuckApplied Materials
OEMApplied MaterialsThermo Fisher
Category——
Wafer size——
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Introduced——
Production run——
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Family—Thermo Fisher Scientific FEI Helios 1200
Specifications
Configuration—Dual beam[1]
GIS chemistries—IEE, EE, C, Pt, W, H20, IDEP[1]
Gas injection system—Maximum (4) Injectors, 1 - Included, Pt/W[1]
Operating system—Windows OS[1]
Manufacturer / Make—Thermo Fisher Scientific / FEI[1]
Model—Helios 1200[1]
Tool type—Dual-beam system[1]
Detectors—TLD and CDEM Detectors[1]
Integrated detector—Integrated EDS Detector[1]
Electron column—ELSTAR UHR Electron column[1]
Ion column—Sidewinder Ion column[1]
Nanomanipulator—Omni probe nanomanipulator[1]
Cleaning system—Plasma cleaner[1]
Vacuum system—Vacuum system[1]
Pumps—(3) IGPs[1]
Turbo / dry pump—Water-cooled turbo and dry PVP[1]
Stage—5-Axis (X, Y, Z, R, Tilt), Compucentric stage, 300 mm piezo[1]
Equipment type—Focused ion beam (FIB) tool[2]
Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com