Waferpedia

Comparison ledger

0010-03254 E Chuckversus780

Applied Materials 0010-03254 E Chuck, Zeiss 780, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
0010-03254 E ChuckApplied Materials
780Zeiss
OEMApplied MaterialsZeiss
Category——
Wafer size——
Process node——
Introduced——
Production run——
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Family—Zeiss 780
Specifications
instrument type—inverted confocal microscope[1]
Instrument type—confocal microscope[2]
Instrument description—multi-purpose, visible light confocal laser scanning microscope[2]
Detector array—34 channel spectral array[2]
Laser lines—405 nm, 458 nm, 488 nm, 514 nm, 561 nm, 594 nm, 633 nm[2]
Mounting—mounted on a fully motorized AxioObserver Z1 inverted microscope stand[3]
Stage—motorized stage[2]
Stage motion—motorized in X,Y[3]
Live-cell environment—full incubation chamber for regulating temperature and CO²[2]
Focus stabilization—Definite Focus module[4]
Tile imaging—software for tile imaging[2]
Type—confocal laser scanning microscope[2]
Optical mode—visible light[2]
Microscope stand—fully motorized AxioObserver Z1 inverted microscope stand[3]
Sources (4)Every fact above is drawn from these public sources
  1. [1]microscopy.duke.edumicroscopy.duke.edu
  2. [2]bcm.edubcm.edu
  3. [3]ohsu.eduohsu.edu
  4. [4]medschool.vanderbilt.edumedschool.vanderbilt.edu