Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Applied Materials eMax CT Plus, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | eMax CT PlusApplied Materials |
|---|---|---|
| OEM | Applied Materials | Applied Materials |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Applied Materials eMax |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | With Genesis GHW-50A RF Generator[5] |
| OEM | Applied Materials[1] | Applied Materials[6] |
| Model | 0010-03485[1] | eMax CT Plus[5] |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | eMax CT+ dielectric etch chamber[7] |
| Process | PVD[3] | silicon nitride etch[6] |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | 300 mm[8] |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | — |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Type | — | dry etcher[6] |
| Wafersize | — | 300 mm[7] |