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Comparison ledger

0010-03485 Magnet Assyversus199

Applied Materials 0010-03485 Magnet Assy, YES 199, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
199YES
OEMApplied MaterialsYES
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FamilyApplied Materials 0010-03485 Magnet AssyYES 199
Specifications
ConfigurationWP AL 300mm PVD[1]—
OEMApplied Materials[1]—
Model0010-03485[1]—
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]—
ProcessPVD[3]—
Wafer size300mm[4]—
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]—
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
Document topic—Processing procedures for BCB adhesion[5]
Material family—Cyclotene Advanced Electronic Resins / benzocyclobutene (BCB)[5]
Adhesion promoters discussed—AP3000 and AP8000[5]
Recommended adhesion promoters—AP3000 and AP8000 are the only adhesion promoters recommended for use with BCB[5]
Recommended pre-clean—O2 plasma, with or without water rinse[5]
Preferred plasma tool type—RIE-type plasma tools[5]
Adhesion test methods—Tape peel, modified edge lift-off (m-ELT), and bump shear[5]
Tape peel standard—ASTM D-3359-93[5]
Pressure cooker test conditions—121°C, 2 atmospheres pressure, 100% relative humidity[5]
Thickness example—BCB bump shear squares are typically 100 μm x 100 μm[5]
Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]wiki.nanotech.ucsb.eduwiki.nanotech.ucsb.edu